Advanced Material Development – PVD Research Platforms

Advanced Material Development

Advanced material development depends on how fast a researcher can move from deposition to result.

Polyteknik’s modular PVD platforms are built for that cycle, combining multiple deposition techniques and in-situ analysis in a single system. This way researchers spend less time reconfiguring hardware, and more time interpreting data, publishing, and finding the next material.

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Researchers at SINTEF Industry with a Flextura 200 – R&D configuration.

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The challenge for researchers

Developing novel thin films, functional coatings, and next-generation material systems means working across techniques that don’t always live in the same tool: sputtering, evaporation, epitaxial growth, and surface analysis.

Research groups working on compound semiconductors, oxide heterostructures, functional coatings, and nanostructured materials often need to combine several of these in a single process flow, without breaking vacuum between steps, and without a fleet of standalone systems to maintain.

This is the challenge our modular, cluster-based PVD platform is built to meet with the Flextura R&D configuration.

What’s possible with the Flextura R&D configuration

High-temperature epitaxial growth

Deposition up to 1000°C supports epitaxial growth and improved layer quality for demanding material systems.

Highly ionised sputtering (HiPIMS)

Enables high aspect ratio metallisation and precise control over layer properties — important for structured and non-planar substrates.

True co-sputtering

Multi-magnetron chambers allow genuine co-deposition for alloy and multi-element thin films.

Electron beam evaporation

For material systems that call for evaporation rather than sputtering, with the same cluster-integrated workflow.

Glancing Angle Deposition (GLAD)

Available by evaporation or sputtering, for engineered nanostructured thin films.

Dynamic in-situ process control

Real-time feedback via PEM or RGA during reactive sputtering keeps stoichiometry and film properties on target as they’re deposited, not just measured after the fact.

Integrated analysis, without breaking vacuum

In-situ RHEED for monitoring epitaxial growth, plus a UHV analytical chamber connected directly to the cluster for LEED, UPS, XPS and other techniques on request — meaning samples can move from growth to analysis without air exposure.

Built for research throughput

Cassette-to-cassette handling (typically 10 substrates, carriers or masks), individual or batch recipes, and automatic loading reduce the operator time spent per experiment — a meaningful factor for groups running high sample volumes.

What’s possible with the Flextura R&D configuration, by research area

Compound semiconductors & quantum electronics

High-temperature deposition (up to 1000°C) combined with in-situ RHEED lets researchers monitor surface reconstruction and growth quality in real time — the same diagnostic approach used for high-mobility two-dimensional electron gas structures, quantum wells, superlattices, and quantum dots.

Suited to groups working on next-generation transistors, quantum computing hardware, and low-dimensional electronic systems.

Sensors & nanostructured surfaces

GLAD’s tunable porosity and column morphology are used to fabricate gas-sensing materials, humidity sensors, and biosensor nanostructures — with applications extending into biomedical devices.

Complex oxide & quantum materials

Precise stoichiometry and oxidation control — supported by dynamic in-situ process control and integrated analysis — is the central requirement for growing superconducting oxide films, oxide heterostructures, topological insulators, and wafer-scale van der Waals heterostructures for quantum technology research.

Photonics & optical coatings

Electron beam evaporation is a proven route to precision optical films — lenses, mirrors, filters, and antireflection coatings. Glancing Angle Deposition adds structural control on top, engineering birefringence for interference coatings and enabling ordered nanostructures for photonic crystal applications.

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