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Glancing Angle Deposition (GLAD)

What Is Glancing Angle Deposition (GLAD)?

Glancing angle deposition (GLAD) is a physical vapour deposition (PVD) technique in which the substrate is tilted to a steep angle relative to the incoming flux of material.

Combined with controlled substrate rotation, this geometry allows precise engineering of thin film microstructure – down to the shape, orientation, and porosity of individual columns.

GLAD is primarily used in evaporation processes, though it can also be applied in sputtering.

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What thin film structures can GLAD produce?


The combination of shadowing and substrate rotation enables a range of engineered microstructures, including:

  • Vertical columns, grown with continuous substrate rotation
  • Zigzag structures, produced by alternating the tilt direction
  • Helical (spring-like) columns, created with slow, continuous rotation combined with tilt
  • Hollow-core structures, engineered porosity for optical or functional applications

The specific geometry is determined by the rotation speed and tilt angle profile used during deposition.

glancing angle deposition

What is a glancing angle?

A glancing angle is the shallow angle between an incoming beam or flux and the surface it strikes – as opposed to the angle measured from the surface normal.

In deposition, working at a glancing angle means the substrate is heavily tilted so that arriving atoms hit the surface at a very oblique trajectory.

This oblique geometry is what makes GLAD fundamentally different from conventional thin film deposition.

How Does the GLAD Process Work?

When atoms arrive at an oblique angle, they condense on the substrate surface and spontaneously form small atomic nuclei. These nuclei then act as physical obstacles.

Because deposition is line-of-sight, incoming atoms cannot reach the shadowed regions behind existing nuclei – a phenomenon known as ballistic shadowing. This causes growth to concentrate on the tops of nuclei rather than between them, and the resulting columns tilt naturally towards the deposition source.

By actively adjusting the tilt angle and rotation of the substrate during deposition, the growing film effectively becomes its own mask. This gives precise real-time control over column direction and geometry.

Industrial GLAD on 200 mm Wafers


Polyteknik has developed and manufactured an industrial concept for glancing angle deposition on 200 mm wafers, based on our Flextura PVD platform.

High-volume production using GLAD processes has been realised on our Flextura Cluster platform, with full process know-how and expertise from the Polyteknik team.

silicon wafer

Are you interested in a GLAD module?

Contact our highly experienced team for an attentive and technical discussion regarding your needs or read more about our PVD systems!

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